(1) Modification of the coating machine The resistance heated evaporation coating machine with a vacuum chamber of 5450 mm was modified. The original evaporation device was retained, and a magnetron sputtering target designed and manufactured by itself was installed using the Flange at the top of the bell. The diameter of the target surface is 560mm, and the target body is internally filled with a neodymium-iron-boron permanent magnet. The target surface has a magnetic field intensity of 500 gauss in the sputtering region and is also provided with cooling water. At the same time, considering the target body and the vacuum bell as the high-frequency insulation and isolation capacitors between the two electrodes of Yin and Yang, a certain thickness of PTFE insulating material is selected so that the target can be used for DC magnetron sputtering. Film coating can also be used for RF magnetron sputtering coating. The original substrate holder of the coating machine is used as a platform, and the substrate frames with baking are installed on the upper and lower sides respectively, so that the coating machine is divided into two upper and lower coating areas, which are used for sputtering coating and evaporation coating respectively. The power cords of the two baking devices are introduced through vacuum sealed electrodes from the spare flange holes at the bottom of the coating machine. Lengthen the original substrate baffle of the coating machine to the upper area, and install baffles at the upper and lower positions of the rotating rod to control evaporation and sputtering, respectively.
(2) Air Path Installation of Sputtering Gas The sputter coating needs to be charged with sputtering gas. We used a spare measuring hole in the vacuum chamber of the evaporation coater to introduce two inflatable systems. All the way, Huaye's automatic pressure controller (model HY-9940C) was selected to control the inflating pressure of the sputter gas; another way was to use the mass flowmeter produced by the Jianzhong Machinery Plant (model 107 was transformed into a vacuum evaporation coating machine for evaporation. Sputtering a dual-purpose coating machine to control the amount of aeration of the reaction gas, which not only ensures the stability of the sputtering gas pressure and the sputtering current, but also has the function of a reactive magnetron sputtering coating, for example, the pure use of Ti, Al, or Ta. Metal targets, by adding an appropriate proportion of oxygen in argon, can be sputter coated to produce high quality TiO2, Al2O3, or Ta2O5 dielectric films.
(3) After the transformation and its application equipment After the above transformation, evaporation coating and sputter coating can be performed simultaneously in a teaching experiment. For vacuum aluminum plating experiments, the evaporation and sputtering substrate holders are allowed to stand, the substrate frame rotating rims cannot be rotated, the substrates are respectively placed on the respective substrate holder, and the substrate is heated, when the coating machine bell jar After the internal vacuum is better than 2@10-3Pa, the evaporation power is turned on and the evaporation source is preheated. After the aluminum wire is pre-melted, the heating power of the evaporation source is increased to reach the evaporation temperature of aluminum, and the baffle above the evaporation source is rapidly removed to start aluminum plating on the substrate. After the evaporation was completed, the pre-sputter baffle was adjusted to completely block the pure aluminum target. The bell jar was filled with Ar gas such that the argon pressure was PAr=015 Pa, and the DC sputtering power was turned on to pre-sputter the aluminum target. After the aluminum target current is stabilized, the pre-sputtering baffle is removed and DC magnetron sputtering is applied to aluminize. Sputtering power is 150200 W. In this way, students can master both coating techniques in a single experiment and compare the two types of aluminum film samples coated in terms of adhesion, light reflectance, etc. to understand the two coatings. The difference in performance of the films prepared by the process technology. The designed exterior target structure is simple and easy to install and remove. The original setting in the bell jar is completely preserved, so it is extremely convenient and quick to restore to a simple vacuum evaporation coating machine. The external magnetron sputtering target is connected to a radio frequency power source, and a dielectric film can be directly used to make a dielectric film, that is, it has the function of RF sputter coating. However, in the above modification, the substrate frame could not be rotated, which affected the uniformity of the obtained film. In order to meet the needs of scientific research, we made a design and modification of the built-in sputtering target for another vacuum evaporation coating machine.
The brazed Plate Heat Exchanger (BPHE) is a type of heat exchanger construction in which metal plates with flat surface offer an effective and efficient method of heat transfer. These plates are joined together by brazing (mainly copper), typically stainless steel. Due to the close contact between the two surfaces, there is a very high heat transfer coefficient, leading to a low overall unit size. They therefore provide much greater efficiency than a Shell And Tube Heat Exchanger.
Brazed Plate Heat Exchangers are widely used in air-conditioning and refrigeration, power generation, and other process applications. For example, within a cooling cycle, a BPHE can be used to transfer heat from one fluid to another. Typical fluids in such coils and systems are either glycol or water. In a power system, a BPHE can be used to cool oils, recirculating lubricants, fuels, and other fluids.
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